Precision plasma sterilization system integrating machine vision and Z-axis closed-loop distance control

To mitigate active-species flux attenuation and localized treatment blind spots caused by variations in jet-to-surface distance during atmospheric-pressure low-

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Precision engineering of molecular orientation in amorphous polymer via thermal nanoimprint lithography: From flow mechanics to optical encryption

Thermal nanoimprint lithography (T-NIL) offers a compelling route for simultaneously patterning polymer surfaces and manipulating internal molecular order. Howe

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Through-silicon via etch uniformity enhancement and aspect-ratio influence on etch rate and profile

High-aspect ratio (HAR) through-silicon via (TSV) etching is a critical process for three-dimensional interconnect (3Di) integration, requiring strict within-wa

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Atomic layer deposition of ZrO2 using a novel high-temperature precursor, (nPrCp)Zr(NMe2)3

ZrO2 thin films were deposited by atomic layer deposition using a new, high-temperature tolerant Zr precursor (nPrCp)Zr(NMe2)3 ((C8H11)Zr[N(CH3)2]3) and ozone.

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Rapid surface smoothing of monocrystalline diamond with bias-pulsed atomic layer etching

Atomic layer etching (ALE), an etch method capable of precisely removing atomic monolayers, is gaining renewed interest as an enabling technology across a wide

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Connecting water outgassing with desorption energetics of molybdenum and technical vacuum materials

Achieving and maintaining ultraclean vacuum environments is critical for contamination-sensitive processes such as semiconductor manufacturing, where residual g

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Machine-learning-guided polymorph selection in molecular beam epitaxy of In2Se3

Indium selenide (In2Se3), a layered chalcogenide with multiple polymorphs, is a promising material for optoelectronic and ferroelectric applications. However, a

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Reduced cathode fall and operating temperature of Ba–Sr–O-coated carbon nanotube thermionic cathodes in Ar–Hg glow discharge plasma

Thermionic cathodes are central to plasma and vacuum devices, where emission efficiency, sheath coupling, and thermal robustness strongly influence performance

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Essential principles and practices in x-ray photoelectron spectroscopy

X-ray photoelectron spectroscopy (XPS) is a widely used technique for the chemical analysis of solid surfaces, sensitive to the chemical environments of atoms v

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Considerations for implementing real-time machine learning tools to evaluate ToF-SIMS data

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) produces complex, information-rich, high-dimensional chemical data sets that can be challenging to ana

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Substrate-engineered growth of ITO nanowires for advanced transparent electrodes with tunable sheet resistance and wettability

This study introduces a novel two-step approach for fabricating high-performance transparent conducting films. The method involves depositing a highly conductiv

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Plasma enhanced oxygen and hydrogen evolution reaction efficiency of titanium vanadate thin film electrodes fabricated by RF magnetron sputtering for green hydrogen production

This research analyses titanium vanadate (TiVO4) thin films, which serve as bifunctional catalysts on electrodes for the production of green hydrogen. To achiev

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Atomistic insights into ion irradiation effects in plasma-enhanced atomic layer deposition of silicon nitride

Molecular dynamics simulations were performed to investigate the effects of low-energy N 2 + ion irradiation on nitridation and chlorine (Cl) removal from silic

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Enhanced oxidation on stepped Rh surfaces

Understanding how surface structure influences oxidation processes is essential for advancing the design of metal-based catalysts. In this study, we investigate

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Influence of Ar ion beam on WSe2 and resulting contact interfaces in 2D field-effect transistors

Semiconducting two-dimensional materials, such as the transition metal dichalcogenides (TMDs), are atomically thin with desirable bandgaps that make them highly

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Adsorption-controlled epitaxy and twin control of γ-GaSe on GaAs (111)B

The III-Se layered semiconductors, including InSe and GaSe, are promising optoelectronic materials due to their relatively high electron mobilities at room temp

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Self-aligned patterning by area-selective etching of polymers and area-selective atomic layer deposition: Decreasing polymer flow and activating noncatalytic surface

Future semiconductor device architectures necessitate innovative patterning processes. Area-selective etching (ASE) of polymers is a self-aligned patterning tec

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Tuning of atomic layer deposition pulse time through physics-informed Bayesian active learning

Atomic Layer Deposition process development is often hindered by time-consuming and precursor-intensive tuning cycles required to identify saturation conditions

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Film and surface stress during Al2O3 thermal atomic layer etching using in situ wafer curvature measurements

In situ wafer curvature measurements were employed to monitor film and surface stress during Al2O3 thermal atomic layer etching (ALE). The Al2O3 thermal ALE was

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Gallium oxide: A potentially photonic material

We fabricated Er3+/Yb3+ codoped Ga2O3 thin films via radio frequency magnetron sputtering and investigated the effect of annealing temperature and Ar/O2 gas rat

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Plasma-assisted atomic layer etching of single-crystal diamond

Applications of near-surface nitrogen-vacancy (NV) centers in diamond are often limited by surface defects created during processing. Understanding and controll

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Publishing FAIR and machine-actionable reviews in materials science: The case for symbolic knowledge in neuro-symbolic artificial intelligence

Scientific reviews are central to knowledge integration in materials science, yet their key insights remain locked in narrative text and static PDF tables, limi

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GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth

We present a technique of patterned in situ molecular beam epitaxy (MBE) selective area sublimation etching of p-type GaN and direct MBE regrowth of n-type GaN

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Atomic-scale confinement at the graphene/SiC interface: A platform for novel two-dimensional nanomaterials

Novel two-dimensional nanomaterials have attracted broad interest for both fundamental physics and next-generation device applications because the atomic-layer

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